Alexander Duval's questions to ASML Holding NV (ASML) leadership • Q2 2025
Question
Alexander Duval from Goldman Sachs asked for more detail on how leading-edge memory is driving litho intensity and for an update on the progress and timeline for ASML's next-generation common platform for EUV systems.
Answer
CEO Christophe Fouquet confirmed that DRAM customers are increasing their use of EUV layers on the latest nodes to simplify complex process flows, a trend he sees as sustainable. Regarding the next platform, he stated that the current platform will be scaled through the end of the decade, with the next-generation common platform (similar to High-NA's) likely becoming available for Low-NA at the beginning of the next decade.