Alexander Duval's questions to ASML HOLDING (ASML) leadership • Q2 2025
Question
Alexander Duval of Goldman Sachs asked for elaboration on the trend of increasing lithography intensity in leading-edge memory and its sustainability. He also requested an update on ASML's progress toward leveraging common platforms for future tool generations.
Answer
President & CEO Christophe Fouquet confirmed a sustained trend of increased EUV layer adoption by DRAM customers on their latest nodes to simplify complex roadmaps, a dynamic he sees as very positive. On platforms, he stated that ASML will continue to improve the current EUV platform through the end of the decade, with the next-generation common platform, similar to the High-NA platform, likely becoming available for Low-NA tools early in the next decade.